Könyv CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155 Alexander A. Demkov

CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155

Nyelv: Angol
Kötés: Puha kötésű
Elérhetőség: Beszállítói készleten
Küldés 9-15 napon belül
14 104 Ft
To address the increasing demands of device scaling, new materials are being introduced into convent...

Információk a könyvről

Nyelv
Angol
Kötés
Könyv - Puha kötésű
Kiadva
2014
oldal
194
EAN
9781107408326
ISBN
1107408326
Enbook ID
02439020
Súly
27
Méretek
152 x 229 x 10

Teljes leírás

To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and alternative channel (Ge or III-V) systems. Several papers address reliability concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces which comprise the gate stack. Topics include: advanced Si-based gate stacks; and alternate channel materials.

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