Könyv Extreme Ultraviolet Lithography Hiroo Kinoshita

Extreme Ultraviolet Lithography

Principles and Basic Technologies

Szerző: Hiroo Kinoshita
Nyelv: Angol
Kötés: Puha kötésű
Elérhetőség: Beszállítói készleten
Küldés 5-8 napon belül
12 123 Ft
This book describes the principles and basic technologies of extreme ultraviolet lithography (EUVL)....

Információk a könyvről

Szerző
Nyelv
Angol
Kötés
Könyv - Puha kötésű
Kiadva
2016
oldal
164
EAN
9783659827402
Enbook ID
12628271
Súly
234
Méretek
150 x 220 x 8

Teljes leírás

This book describes the principles and basic technologies of extreme ultraviolet lithography (EUVL). The topics include why research on EUVL was begun and why an exposure wavelength of 13.5 nm was selected; the design of the optical system, which employs reflective mirrors; the use of a multilayer film to make a reflective-type mask and how masks are inspected; an historical overview of the development of light sources; resist materials; and the recent performance of lithographic tools for mass production. Three innovations were key to the development: of Mo/Si multilayer films with a high reflectivity and to the shaping and metrology of aspherical mirrors with a precision of less than 0.1 nm. The technology for measuring figure error and the fabrication technology now meet the performance targets. Thus, EUVL has become the most promising lithographic technology for device fabrication at the 7-nm node.

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