Könyv Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System Seiji Samukawa

Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System

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Szerző: Seiji Samukawa
Nyelv: Angol
Kötés: Puha kötésű
Elérhetőség: Beszállítói készleten
Küldés 5-8 napon belül
19 639 Ft
This book aims to provide a good understanding of the etching profile technologies which do not dist...

Információk a könyvről

Szerző
Nyelv
Angol
Kötés
Könyv - Puha kötésű
Kiadva
2014
oldal
40
EAN
9784431547945
ISBN
4431547940
Enbook ID
02303841
Súly
949
Méretek
155 x 235 x 8

Teljes leírás

This book aims to provide a good understanding of the etching profile technologies which do not disturb the plasma for the first time. This book introduces 3 types of sensor such as on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data. Readers are made familiar with these sensors, which can measure real plasma process surface conditions such as defect generations due to UV-irradiation, ion flight direction due to charge-up voltage in high aspect ratio structures and ion sheath conditions at the plasma/surface interface. The plasma etching profile realistically predicted by a computer simulation based on output data from these sensors is described.

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