Könyv Materials Processing Using Plasma Focus Muhammad Hassan

Materials Processing Using Plasma Focus

Plasma Characterization and Processing of Industrial Materials

Szerző: Muhammad Hassan
Nyelv: Angol
Kötés: Puha kötésű
Kiadó: VDM Verlag
Elérhetőség: Kiadói készleten rendelésre
Küldés 17-27 napon belül
23 674 Ft
The present research work reports the parametric study of ion beams emitted from two different Mathe...

Információk a könyvről

Szerző
Nyelv
Angol
Kötés
Könyv - Puha kötésű
Kiadva
2010
oldal
168
EAN
9783639276633
ISBN
3639276639
Enbook ID
06834881
Kiadó
Súly
254
Méretek
152 x 229 x 10

Teljes leírás

The present research work reports the parametric study of ion beams emitted from two different Mather type plasma focus devices and their utilization in materials processing. Experiments have been conducted by using a conventional 2.3 kJ UNU/ICTP plasma focus device and the NX2 device (a repetitive plasma focus). The ion parameters such as energy, energy distribution, number density and current density are evaluated in the ambient gas pressure by employing a BPX65 photodiode and a Faraday cup (FC) using time of flight technique. A major motivation is to establish the optimum processing conditions for ion nitriding, surface modification, phase changes and carburizing of materials of industrial interest like Ti, AlFe1.8Zn0.8 alloy and SS-321 in plasma environment. The processed samples are characterized for structural and morphological changes, compositional profile and surface hardness by employing XRD, SEM FESEM, EDX, XPS, Raman spectroscopy and Vickers microhardness test. The SRIM code and microindentation measurements are used to estimate the depth profile of the modified layers.

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