Könyv Rapid Thermal Processing for Future Semiconductor Devices Fukuda

Rapid Thermal Processing for Future Semiconductor Devices

Szerző: Fukuda
Nyelv: Angol
Kötés: Puha kötésű
Kiadó: Elsevier Books
Elérhetőség: Beszállítói készleten
Küldés 9-15 napon belül
57 376 Ft
This volume is a collection of papers which were presented at the 2001 International Conference on R...

Információk a könyvről

Szerző
Nyelv
Angol
Kötés
Könyv - Puha kötésű
Kiadva
2003
oldal
160
EAN
9780444513397
ISBN
0444513396
Enbook ID
04079629
Súly
310
Méretek
172 x 243 x 17

Teljes leírás

This volume is a collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. This symposium is second conference followed the previous successful first International RTP conference held at Hokkaido in 1997. The RTP 2001 covered the latest developments in RTP and other short-time processing continuously aiming to point out the future direction in the Silicon ULSI devices and II-VI, III-V compound semiconductor devices. This book covers the following areas such as: advanced MOS gate stack, integration technologies, advancd channel engineering including shallow junction, SiGe, hetero-structure, novel metallization, inter-connect, silicidation, low-k materials, thin dielectrics including gate dielectrics and high-k materials, thin film deposition including SiGe, SOI and SiC, process and device modelling, Laser-assisted crystallization and TFT device fabrication technologies, temperature monitoring and slip-free technologies.

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