Silicon Devices and Process Integration

Name: Silicon Devices and Process Integration
Brand: Springer-Verlag New York Inc.
SKU: 9780387367989
Price: 61632 HUF
Availability: InStock

Deep Submicron and Nano-Scale Technologies

Szerző: Badih El- Kareh

Nyelv:

Kötés: Kemény kötésű

Kiadó: Springer-Verlag New York Inc.

Elérhetőség: Beszállítói készleten alacsony példányszámban

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Silicon Devices and Process Integration covers state-of-the-art silicon devices, their characteristi...

Információk a könyvről

Szerző

Badih El- Kareh

Nyelv

Angol

Kötés

Könyv - Kemény kötésű

Kiadva

2009

oldal

598

EAN

9780387367989

ISBN

0387367985

Enbook ID

01382042

Kiadó

Springer-Verlag New York Inc.

Súly

1040

Méretek

155 x 235 x 45

Teljes leírás

Silicon Devices and Process Integration covers state-of-the-art silicon devices, their characteristics, and their interactions with process parameters. It serves as a comprehensive guide which addresses both the theoretical and practical aspects of modern silicon devices and the relationship between their electrical properties and processing conditions. The book is compiled from the author s industrial and academic lecture notes and reflects years of experience in the development of silicon devices. §Features include:§§§A review of silicon properties which provides a foundation for understanding the device properties discussion, including mobility-enhancement by straining silicon;§§§State-of-the-art technologies on high-K gate dielectrics, low-K dielectrics, Cu interconnects, and SiGe BiCMOS;§§§CMOS-only applications, such as subthreshold current and parasitic latch-up;§§§Advanced Enabling processes and process integration.§§This book is written for engineers and scientists in semiconductor research, development and manufacturing. The problems at the end of each chapter and the numerous charts, figures and tables also make it appropriate for use as a text in graduate and advanced undergraduate courses in electrical engineering and materials science.

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Silicon Devices and Process Integration

Deep Submicron and Nano-Scale Technologies

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